AMAT(Applied Materials) 0090-09166 Cathode Pedestal DPX Centura

Product Overview

The 0090‑09166 is a dedicated cathode pedestal for the Applied Materials (AMAT) DPX Centura process chamber and a core load‑bearing component of 200mm etch chambers. Directly installed inside the DPX process chamber, it integrates three core functions: wafer support, RF conduction, and thermal conduction. Compatible with the DPX etch chamber of the Centura platform, it stably positions wafers during semiconductor plasma etching processes and ensures repeatability and consistency of etching results. During long‑term mass production of semiconductor fabs, this pedestal is prone to surface coating wear, thermal deformation, and poor RF contact. It is a high‑frequency replacement critical spare part for routine maintenance of DPX Centura chambers.

Technical Specifications

• Part Number: 0090‑09166
• Product Name: Cathode Pedestal
• Compatible Equipment: AMAT Centura DPX Process Chamber
• Compatible Wafer Size: 200mm
• Chamber Type: Plasma Etch Process Chamber
• Main Base Material: Aluminum alloy base with plasma corrosion resistant coating on the surface
• Operating Environment: High‑vacuum plasma environment
• Integrated Functions: Wafer support, RF power conduction, thermal exchange and conduction
• Compatible Processes: Dielectric etching, silicon etching, compliant with standard process recipes of Centura DPX chambers
• Installation Position: Cathode station at the lower part of DPX chamber

Functional Advantages

• Stably supports 200mm wafers, precisely controls wafer flatness in the DPX Centura vacuum chamber, effectively avoids etching deviation caused by wafer offset, and ensures process accuracy.
• Delivers reliable RF conduction performance, enabling uniform plasma energy transfer to the wafer surface, significantly reducing intra‑wafer etching rate difference and improving process uniformity.
• Adopts an aluminum alloy base paired with plasma‑resistant coating to withstand continuous bombardment by process gases, reduce generation of process by‑products and particles, and lower the risk of wafer contamination.
• Equipped with a stable thermal conduction path, cooperating accurately with the chamber temperature control system to realize controllable wafer temperature, stabilize the etching process window, and ensure mass production stability.

• Features strict mechanical positioning tolerances. No large‑scale equipment recalibration is required after replacement, greatly shortening chamber downtime and improving fab throughput.

Product Features

• Adopts one‑piece machining structure without splicing gaps, fundamentally reducing accumulation of process by‑products and lowering chamber contamination risks.
• Uniform and dense surface coating resists long‑term plasma impact and corrosive process gas erosion, effectively extending component service life.
• Positioning holes perfectly match the mechanical interface of DPX Centura chambers, enabling easy alignment and installation and reducing maintenance difficulty.
• Precisely polished RF contact surface with low contact impedance effectively suppresses abnormal arcing during processing and avoids equipment errors and process abnormalities.
• Precisely matches the docking structure of the chamber helium cooling circuit, ensuring high heat exchange efficiency between the pedestal and cooling system and stabilizing wafer processing temperature.
• Dimensions strictly comply with official AMAT mechanical drawings for DPX Centura chambers, featuring high standardization and excellent equipment interchangeability.

Application Fields

This cathode pedestal is mainly applied to 8‑inch (200mm) semiconductor wafer manufacturing lines, matching Centura‑platform DPX etch chambers for plasma etching of silicon layers, oxide layers, and nitride layers. It is widely used in the wafer processing of power semiconductor devices, MEMS devices, discrete devices, and traditional logic chips. It meets the demands of wafer fab preventive maintenance, fault spare part replacement, and refurbished equipment chamber renovation, and is also applicable to spare part replacement for DPX Centura equipment in semiconductor process laboratories and pilot production lines.

Working Principle

The equipment robot transfers 200mm wafers into the DPX Centura chamber, and the chamber lift pins lift and place wafers stably on the bearing surface of the 0090‑09166 cathode pedestal. As the core cathode electrode, the pedestal receives power from the RF power supply and excites stable plasma inside the sealed chamber. Meanwhile, the cooling medium circuit performs efficient heat exchange with the pedestal, continuously removing heat generated by plasma bombardment on wafers and stabilizing wafer operating temperature accurately. With precise mechanical positioning, the pedestal restricts the placement position of each wafer, ensuring a consistent relative position between wafers and the plasma field and achieving uniform etching results for batch wafers. After the single‑wafer process is completed, the lift pins raise the wafer, and the robot unloads the wafer to finish one processing cycle. Long‑term operation leads to coating wear and performance degradation of the pedestal, requiring timely replacement to restore the standard process performance of the chamber.

Product Comparison

Note: The 0090‑09166 cannot be directly applied to DPS and MXP series chambers. Differences in mechanical interfaces, RF circuits and cooling circuits will cause process abnormalities and arcing alarms if used forcibly.

Matching Product Models

• 0010‑03339 (Heater Assembly)
• 0020‑32164 (Lift Pin Assembly)
• 0020‑09376 (Viton O‑Ring, Chamber Seal)
• 0190‑09442 (RF Match Assembly)
• 0040‑34031 (Focus Ring)
• 0090‑04958 (Chamber Lid Assy, DPX Chamber Top Cover Assembly)

Tips: When replacing the 0090‑09166 cathode pedestal, it is recommended to inspect the wear status of seals, lift pins and focus rings and replace matching spare parts as required to avoid secondary disassembly and assembly, reducing maintenance costs and downtime.

Frequently Asked Questions